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DEFECT CAUSING STAGE ANALYZING DEVICE AND DEFECT CAUSING STAGE ANALYZING METHOD

机译:缺陷原因分析装置和缺陷原因分析方法

摘要

PROBLEM TO BE SOLVED: To analyze whether a defect detected through final inspection is caused by a process stage or inspection stage.;SOLUTION: A linking part 17 of a defect causing stage analyzing device 16 reads illumination defect information and TFT correction information out of an information management database 9 as to one liquid crystal display panel, and relates both the results (what is called linking). A classification part 18 classifies the illumination defect information by the TFT correction information. An overlap mapping part 19 maps the classified illumination defect information on the same coordinates one over another as to one lot or a plurality of lots of liquid crystal display panels. A map display part 20 displays one or a plurality of overlap maps which are preset or specified by an operator among the plurality of overlap maps which are thus obtained.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:分析通过最终检查发现的缺陷是由处理阶段还是由检查阶段引起的;解决方案:缺陷引起阶段分析装置16的链接部分17从显示器中读取照明缺陷信息和TFT校正信息。信息管理数据库9关于一个液晶显示面板,并且将两个结果相关联(所谓的链接)。分类部18通过TFT校正信息对照明不良信息进行分类。重叠映射部分19将分类的照明缺陷信息在同一坐标上彼此映射到一批或多批液晶显示面板。地图显示部分20显示由此获得的多个重叠地图之中由操作员预设或指定的一个或多个重叠地图。COPYRIGHT:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2013257208A

    专利类型

  • 公开/公告日2013-12-26

    原文格式PDF

  • 申请/专利权人 SHARP CORP;

    申请/专利号JP20120133020

  • 发明设计人 TOYA MASAO;IMAI KATSUKI;

    申请日2012-06-12

  • 分类号G01N21/956;

  • 国家 JP

  • 入库时间 2022-08-21 16:15:30

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