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Measuring device for measuring imaging optical system i.e. projection lens, for forming object field in image plane, has detector arranged in front of optical system, and reference mark arranged behind optical system
Measuring device for measuring imaging optical system i.e. projection lens, for forming object field in image plane, has detector arranged in front of optical system, and reference mark arranged behind optical system
The device (400) has an auxiliary light field whose source is arranged in front of an imaging optical system i.e. projection lens (110). A detector (330) is arranged in front of the optical system, and a reference mark is arranged behind the optical system. The auxiliary light field is produced by a grid pattern (312), and the reference mark is realized by another grid pattern (212). The grid patterns are arranged in front of the optical system. A substrate is held by a substrate support assembly. An independent claim is also included for a method for patterning a substrate.
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