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Irradiation unit device for irradiating substrate in process chamber, has irradiation mechanism and coils formed from wolfram for sending infrared radiation, where coils are fixed at distance from carrier plate by spacers
Irradiation unit device for irradiating substrate in process chamber, has irradiation mechanism and coils formed from wolfram for sending infrared radiation, where coils are fixed at distance from carrier plate by spacers
The device has an irradiation mechanism and coils (12) formed from wolfram for sending infrared radiation. The coils include regions with different powers per length. The coils are fixed at a distance from a carrier plate (10) by spacers (16). The carrier plate is made of ceramic material formed from steatite, aluminum oxide, silicon dioxide, and zirconium oxide. The spacers are arranged at a distance preferably from 15 to 25 millimeters. An atmosphere containing protective gases such as noble gas, argon, xenon, krypton or nitrogen, is present in a process chamber. An independent claim is also included for a method for irradiating a substrate.
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