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METHOD FOR PREPARING A COMPLEX SUBSTRATE FILM AND BACKGRINDING TAPE FOR SEMICONDUCTOR WAFER COMPRISING A COMPLEX SUBSTRATE FILM PREPARED BY THE SAME
METHOD FOR PREPARING A COMPLEX SUBSTRATE FILM AND BACKGRINDING TAPE FOR SEMICONDUCTOR WAFER COMPRISING A COMPLEX SUBSTRATE FILM PREPARED BY THE SAME
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机译:包含由相同的薄膜制备的复合衬底薄膜的半导体衬底的复合衬底薄膜的制备方法和背磨带
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摘要
PURPOSE: A backgrinding tape comprising a complex substrate film is provided to prevent a semiconductor wafer from bending in the process of thickness reduction of the semiconductor wafer and to reduce peeling force, thereby preventing errors in a peeling process induced in the process of removing the backgrinding tape. CONSTITUTION: A method for preparing a complex substrate film comprises the steps of: providing a polyolefin film with a thickness of 50 to 200 um; forming an adhesive layer (4) by applying an adhesive composition on a surface of the polyolefin film; and combining the polyolefin film having the adhesive layer with a polyester film having a thickness of 10 to 50 um. The adhesive composition comprises 100 parts by weight of an acrylic copolymer, 1 to 5 parts by weight of a thermocurable isocyanate curing agent, and 10 to 30 parts by weight of a solvent.
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