首页>
外国专利>
DEPOSITING DEVICE USING A HIGH DENSITY PLASMA AND A METHOD THEREOF, CAPABLE OF CHANGING A TRANSPORTING ROUTE OF THE HIGH DENSITY PLASMA WITH A MAGNETIC FIELD CONTROL TECHNOLOGY
DEPOSITING DEVICE USING A HIGH DENSITY PLASMA AND A METHOD THEREOF, CAPABLE OF CHANGING A TRANSPORTING ROUTE OF THE HIGH DENSITY PLASMA WITH A MAGNETIC FIELD CONTROL TECHNOLOGY
展开▼
机译:使用高密度等离子体的沉积装置及其方法,能够通过磁场控制技术改变高密度等离子体的传输路径
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: A depositing device using high density plasma and a method thereof are provided to expect an effect improving deposition performance, to deposit a substrate at a high speed, and to clean the substrate.;CONSTITUTION: A depositing device using a high density plasma comprises; a chamber(10) with an outlet; a plasma generating unit(20) emitting the high density plasma to an internal space of the chamber; a magnetic field generating unit(50) forming a magnetic field for guiding the high density plasma; a target(30) activated by the high density plasma; and a substrate(40) deposited by the activation of a target.;COPYRIGHT KIPO 2013;[Reference numerals] (1,2,3) Plasma induction magnetic field coil; (20) High density plasma source; (AA) Deposition substrate power supply; (BB) Deposition substrate; (CC) Sputtering target power supply
展开▼