首页> 外国专利> NITRIDE SEMICONDUCTOR DEVICE HAVING A NORMALLY-OFF GaN HEMT AND A DIODE, A MANUFACTURING METHOD THEREOF AND A NITRIDE SEMICONDUCTOR POWER DEVICE

NITRIDE SEMICONDUCTOR DEVICE HAVING A NORMALLY-OFF GaN HEMT AND A DIODE, A MANUFACTURING METHOD THEREOF AND A NITRIDE SEMICONDUCTOR POWER DEVICE

机译:具有常断型GaN HEMT和二极管的氮化物半导体器件,其制造方法以及氮化物半导体功率器件

摘要

PURPOSE: A nitride semiconductor device, a manufacturing method thereof and a nitride semiconductor power device are provided to implement a high electrical characteristic by increasing the gate-source voltage of a normally-on GaN HEMT without using an additional external circuit.;CONSTITUTION: A nitride semiconductor layer(30) is formed on a substrate(10). The nitride semiconductor layer has a two dimensional electron gas channel(35). A D mode FET(100) includes a gate electrode(70) schottky-contacted on the nitride semiconductor layer. A schottky diode(200) includes an anode electrode(80) schottky-contacted on the nitride semiconductor layer. The anode electrode is connected to the gate electrode of the D mode FET.;COPYRIGHT KIPO 2013
机译:目的:提供一种氮化物半导体器件,其制造方法和氮化物半导体功率器件,以通过增加常开型GaN HEMT的栅极-源极电压而实现高电特性,而无需使用额外的外部电路。在衬底(10)上形成氮化物半导体层(30)。氮化物半导体层具有二维电子气通道(35)。 D模式FET(100)包括肖特基接触在氮化物半导体层上的栅电极(70)。肖特基二极管(200)包括肖特基接触在氮化物半导体层上的阳极电极(80)。阳极连接到D型FET的栅极。; COPYRIGHT KIPO 2013

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