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首页> 外国专利> OPTICAL FILM THICKNESS MEASUREMENT METHOD, OPTICAL FILM THICKNESS MEASUREMENT SYSTEM, OPTICAL FILM THICKNESS MEASUREMENT PROGRAM, AND SO ON

OPTICAL FILM THICKNESS MEASUREMENT METHOD, OPTICAL FILM THICKNESS MEASUREMENT SYSTEM, OPTICAL FILM THICKNESS MEASUREMENT PROGRAM, AND SO ON

机译：光学膜厚测量方法，光学膜厚测量系统，光学膜厚测量程序等

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摘要

The present invention addresses the problem of measuring the optical film thickness of an interference film by reflection interference spectroscopy and, when there is a change in the optical film thickness of the interference film, measuring the amount of the change of the optical film thickness. In the measurement of the optical film thickness of an interference film in a laminate in which the interference film is laminated on a substrate by reflection interference spectroscopy, attention is paid to the tendency that as the optical film thickness of the interference film increases, the peak position of the spectral distribution of spectral reflectivity (or the change amount thereof) moves to the long wavelength side, for example, in the order of a curve (b1), a curve (b2), a curve (b3), and a curve (b4) and the number of peaks thereof increases, the relationship between a wavelength at which the optical film thickness of the interference film provides the extreme value of spectral reflectivity (or change amount) in a known laminate and the optical film thickness is created in advance for each of different optical film thicknesses, and the optical film thickness which provides an extreme value at an approximate wavelength is identified by applying, to the abovementioned relationship, a wavelength at which the extreme value of spectral reflectivity (or change amount) in the laminate to be measured obtained by the reflection interference spectroscopy is provided, thereby finding the optical film thickness of the interference film to be measured.
机译：本发明解决了通过反射干涉光谱法测量干涉膜的光学膜厚度的问题，并且当干涉膜的光学膜厚度发生变化时，测量光学膜厚度的变化量。在通过反射干涉光谱法在其中将干涉膜层压在基板上的层压体中的干涉膜的光学膜厚度的测量中，应注意的趋势是，随着干涉膜的光学膜厚度的增加，波峰增大。光谱反射率的光谱分布的位置（或其变化量）例如以曲线（b1），曲线（b2），曲线（b3）和曲线的顺序向长波长侧移动。如果（b4）的峰数增加，则在已知的层叠体中，干涉膜的光学膜厚为光谱反射率的极值（或变化量）的波长与光学膜厚之间的关系为对于每个不同的光学膜厚度，光学膜厚度前进，并且通过将上述关系应用于通过设置反射波长，通过反射干涉光谱法求出被测定层叠体中的光谱反射率的极值（或变化量）的极值，求出被测定干涉膜的光学膜厚。

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