首页>
外国专利>
Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation
Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation
展开▼
机译：光刻模拟中有限维度量空间中不规则数据的插值
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern. Embodiments for preprocessing a pattern in a library of patterns are disclosed for determining a transformation matrix for the first pattern, determining a range for the first pattern, wherein a distance between a representation for a first pattern and a representation for a second pattern is within the range and the second pattern can be transformed with the transformation matrix to provide information about the second pattern, and associating the range and the transformation matrix with the first pattern.
展开▼
