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Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions
Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions
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机译：用于高能等离子体表面处理和高能沉积条件的磁场配置
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摘要
A vacuum deposition system for forming a dense coating includes a substrate holder for holding a substrate having a substrate surface to be coated, a magnetic field generator, an optional electron source, an optional electron drain, and a deposition source. The magnetic field generator generates a magnetic field in which the substrate is at least partially immersed such that a component of the magnetic field is parallel to the substrate surface such that electrons are forced along a path that causes ionization in the vicinity of the substrate surface. The magnetic field strength at the substrate surface is between 5 and 1000 Gauss. The deposition source provides material to coat the substrate. The vacuum deposition system includes the optional electron source if the deposition source does not provide a source of electrons. A method for depositing a dense coating is also provided.
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