首页>
外国专利>
Method of forming a fine pattern forming method and functionally graded type inorganic resist, functionally graded type inorganic resist-coated substrate, functionally graded type inorganic resist with a cylindrical base material, of functionally graded type inorganic resist, as well as processes for the preparation thereof and inorganic resist
Method of forming a fine pattern forming method and functionally graded type inorganic resist, functionally graded type inorganic resist-coated substrate, functionally graded type inorganic resist with a cylindrical base material, of functionally graded type inorganic resist, as well as processes for the preparation thereof and inorganic resist
In functionally graded type inorganic resist and a rear surface opposite to the main surface and the main surface that the laser is irradiated, changes state by heat, the functionally graded type inorganic resist contains a single layer resist, of the single-layer resist The continuously varied up to the back side from the main surface side of the composition, in the single-layer resist, the anisotropy of the region reaches a certain temperature when the laser is irradiated locally from said main surface, at least It is continuously increased toward the back side.
展开▼