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Phenolic resin, epoxy resin, alkali-developable resin composition and alkali-developable photosensitive resin composition

机译：酚醛树脂，环氧树脂，碱显影性树脂组合物和碱显影性光敏树脂组合物

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摘要

PPROBLEM TO BE SOLVED: To provide an alkali-developable resin composition which is excellent in sensitivity, alkali resistance, electrical properties, etc. and is capable of forming a fine pattern with a high precision, and an alkali-developable photosensitive resin composition. PSOLUTION: A phenolic resin (A) is prepared by reacting a compound of formula (I) with an aldehyde compound or a derivative thereof, a compound of formula (II) or a compound of formula (III) or (III') and an aldehyde compound or a derivative thereof. An epoxy resin (B) is prepared by subjecting a phenolic hydroxyl group of the phenolic resin (A) to glycidyl etherification. The alkali-developable resin composition comprises a photopolymerizable unsaturated compound obtained by imparting an ethylenically unsaturated bond to the epoxy resin (B). The alkali-developable photosensitive resin composition is prepared by adding a photopolymerization initiator and a color material to the alkali-developable resin composition. PCOPYRIGHT: (C)2008,JPO&INPIT

机译：

要解决的问题：提供一种碱显影性树脂组合物，其具有优异的灵敏度，耐碱性，电性能等，并且能够以高精度形成精细图案，以及碱显影性光敏树脂。组成。

溶液：通过使式（I）的化合物与醛化合物或其衍生物，式（II）的化合物或式（III）或（III'的化合物）反应来制备酚醛树脂（A）。）和醛化合物或其衍生物。通过使酚醛树脂（A）的酚羟基进行缩水甘油醚化来制备环氧树脂（B）。碱显影性树脂组合物包含通过将烯键式不饱和键赋予环氧树脂（B）而获得的光聚合性不饱和化合物。通过将光聚合引发剂和着色材料添加到碱可显影树脂组合物中来制备碱可显影光敏树脂组合物。

版权：（C）2008，日本特许厅＆INPIT 展开▼

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公开/公告号JP5311750B2

专利类型
公开/公告日2013-10-09

原文格式PDF
申请/专利权人株式会社ＡＤＥＫＡ;
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申请/专利号JP20070049078
发明设计人高日俊輔;品川真澄;藤上和生文;石黒智仁;
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申请日2007-02-28
分类号C08G8/00;G03F7/027;G03F7/004;H01L21/027;C08G59/18;C08G8/04;
国家 JP
入库时间 2022-08-21 16:54:46

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