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QUANTUM DOT ABSORPTION SUBSTRATE AND QUANTUM DOT ABSORPTION SUBSTRATE MANUFACTURING METHOD

机译:量子点吸收基体和量子点吸收基体的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a quantum dot absorption substrate and a quantum dot absorption substrate manufacturing method, which can improve photoelectric conversion efficiency.;SOLUTION: A quantum dot absorption substrate manufacturing method comprises: arranging an inverse opal structure of TiO2 that serves as a photoelectric conversion layer 102 on a substrate 101; immersing in a CdS formation solution for a predetermined time, the substrate 101 on which the photoelectric conversion layer 102 having the inverse opal structure TiO2 is arranged, to cause CdS quantum dots to be absorbed by a skeleton surface of the photoelectric conversion layer 102 of the inverse opal structure and by a surface of the photoelectric conversion layer 102 on the substrate 101 to form a first photosensitization layer 103; and similarly, forming a second photosensitization layer 104 by immersing the substrate 101 in a CdSe formation solution.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种可提高光电转换效率的量子点吸收基板及量子点吸收基板的制造方法。解决方案:一种量子点吸收基板的制造方法包括:布置TiO 的反蛋白石结构。 2 ,其用作基板101上的光电转换层102;将其浸入CdS形成溶液中预定时间后,在其上布置具有反蛋白石结构TiO 2 的光电转换层102的基板101上,使CdS量子点被骨架表面吸收。形成反蛋白石结构的光电转换层102,并在基板101上的光电转换层102的表面上形成第一光敏层103;类似地,通过将​​基板101浸入CdSe形成溶液中来形成第二光敏层104。版权所有:(C)2013,JPO&INPIT

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