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ELECTROLESS Ni PLATING METHOD OF AN INDUSTRIAL VACUUM CHAMBER FOR STABLY MAINTAINING AN ELECTROLESS Ni PLATING SOLUTION AND AN ELECTROLESS Ni PLATED INDUSTRIAL VACUUM CHAMBER BY THE SAME
ELECTROLESS Ni PLATING METHOD OF AN INDUSTRIAL VACUUM CHAMBER FOR STABLY MAINTAINING AN ELECTROLESS Ni PLATING SOLUTION AND AN ELECTROLESS Ni PLATED INDUSTRIAL VACUUM CHAMBER BY THE SAME
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机译：用同一方法稳定地保持化学镀镍溶液和化学镀镍工业真空腔的化学镀镍室的方法
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PURPOSE: An electroless Ni plating method of an industrial vacuum chamber and an electroless Ni plated industrial vacuum chamber by the same are provided to implement efficient electroless Ni plating without surface corrosion and foreign materials in a large steel vacuum chamber.;CONSTITUTION: An electroless Ni plating method of an industrial vacuum chamber comprises the steps of: degreasing a large-capacity vacuum chamber by acid for 30-40 minutes and rinsing the vacuum chamber in two stages(S100), selecting one or more kinds of mixtures from the group consisting of NaOH, Na2CO3, and Na3PO4, electrolytically degreasing the vacuum chamber with the one or more kinds of mixtures at 5-15V and 2500-3500A and rinsing the vacuum chamber in two stages(S200,S300,S400), pickling the vacuum chamber through a mixture of sulfuric acid and ammonium hydrogen-fluoride for 5-15 minutes and rinsing the vacuum chamber in two stages(S500,S600), controlling the vacuum chamber in Ni plating bath pH 4-6 using a pH adjuster, electroless-plating the vacuum chamber with Ni and rinsing the vacuum chamber in three stages(S700,S800), and drying the vacuum chamber(S900).;COPYRIGHT KIPO 2012
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