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APPARATUS FOR MANUFACTURING A SEMICONDUCTOR WITH A WORKING PRESSURE ADJUSTING DEVICE FOR A SLIT VALVE TO REDUCE IMPURITIES CAPABLE OF EXTENDING THE LIFE OF THE SLIT VALVE
APPARATUS FOR MANUFACTURING A SEMICONDUCTOR WITH A WORKING PRESSURE ADJUSTING DEVICE FOR A SLIT VALVE TO REDUCE IMPURITIES CAPABLE OF EXTENDING THE LIFE OF THE SLIT VALVE
PURPOSE: An apparatus for manufacturing a semiconductor with a working pressure adjusting device for a slit valve is provided to reduce impurities generated from micro damage to an O-ring or impact on a valve plate by pressing a slit valve using less pressure.;CONSTITUTION: A load lock chamber(30) loads or unloads a wafer for processing. A transfer chamber(20) is installed between a process chamber(10) and the load lock chamber and transfers the wafer. A slit valve(50) opens and closes a slit serving as a path for the wafer. A vacuum pump(72) is installed in a vacuum line(70) for forming the vacuum of each chamber. A gate valve(71) having only switching capability is installed at a front end of the vacuum pump in the vacuum line.;COPYRIGHT KIPO 2012
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