首页> 外国专利> APPARATUS FOR MANUFACTURING A SEMICONDUCTOR WITH A WORKING PRESSURE ADJUSTING DEVICE FOR A SLIT VALVE TO REDUCE IMPURITIES CAPABLE OF EXTENDING THE LIFE OF THE SLIT VALVE

APPARATUS FOR MANUFACTURING A SEMICONDUCTOR WITH A WORKING PRESSURE ADJUSTING DEVICE FOR A SLIT VALVE TO REDUCE IMPURITIES CAPABLE OF EXTENDING THE LIFE OF THE SLIT VALVE

机译:用于制造具有工作压力调节装置的半导体装置的装置,该装置用于调节分流阀,以减少可延长分流阀寿命的杂质

摘要

PURPOSE: An apparatus for manufacturing a semiconductor with a working pressure adjusting device for a slit valve is provided to reduce impurities generated from micro damage to an O-ring or impact on a valve plate by pressing a slit valve using less pressure.;CONSTITUTION: A load lock chamber(30) loads or unloads a wafer for processing. A transfer chamber(20) is installed between a process chamber(10) and the load lock chamber and transfers the wafer. A slit valve(50) opens and closes a slit serving as a path for the wafer. A vacuum pump(72) is installed in a vacuum line(70) for forming the vacuum of each chamber. A gate valve(71) having only switching capability is installed at a front end of the vacuum pump in the vacuum line.;COPYRIGHT KIPO 2012
机译:目的:提供一种用于制造带有缝隙阀工作压力调节装置的半导体的设备,以通过用较小的压力按压缝隙阀来减少因对O形环的微损伤或撞击在阀板上而产生的杂质。装载锁定室(30)装载或卸载晶片以进行处理。转移室(20)安装在处理室(10)和负载锁定室之间,并转移晶片。狭缝阀(50)打开和关闭用作晶片路径的狭缝。真空泵(72)安装在真空管线(70)中,用于形成每个腔室的真空。在真空管路中的真空泵的前端安装有仅具有切换功能的闸阀(71)。COPYRIGHTKIPO 2012

著录项

  • 公开/公告号KR101132261B1

    专利类型

  • 公开/公告日2012-04-02

    原文格式PDF

  • 申请/专利权人 SUNRIN CO. LTD.;

    申请/专利号KR20110057542

  • 发明设计人 BAEK JONG SU;LIM KWANG WOOK;

    申请日2011-06-14

  • 分类号H01L21/02;H01L21/677;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:20

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