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METHOD FOR FORMING AMORPHOUS CARBON FILM, AMORPHOUS CARBON FILM, MULTILAYER RESIST FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER-READABLE RECORDING MEDIUM
METHOD FOR FORMING AMORPHOUS CARBON FILM, AMORPHOUS CARBON FILM, MULTILAYER RESIST FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER-READABLE RECORDING MEDIUM
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机译：非晶碳膜的形成方法，非晶碳膜，多层电阻膜，半导体装置的制造方法以及计算机可读取的介质
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摘要
upper electrode and the lower electrode is arranged in the processing vessel of the parallel plate type plasma CVD apparatus for use , and providing a step, carbon monoxide and an inert gas into the processing container for placing a substrate on the lower electrode , and also applies a high frequency power to at least the upper electrode by the decomposition of carbon monoxide generated by the plasma, and film formation by depositing the amorphous carbon on the substrate that a step . The top electrode is preferably a carbon electrode .
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