首页> 外国专利> METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN FLUIDS, USING A NON-NEWTONIAN FLUID INDICATING THE FLOW OF PLUG FOR CLEANING A SUBSTRATE

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN FLUIDS, USING A NON-NEWTONIAN FLUID INDICATING THE FLOW OF PLUG FOR CLEANING A SUBSTRATE

机译:用非牛顿流体清洗基质的方法和装置,使用非牛顿流体来表示用于清洗基质的塞流

摘要

PURPOSE: A method and apparatus for cleaning a substrate using non-newtonian fluids are provided to easily remove photoresist material from the surface of the substrate by combining an ozone combined with a deionized water and an organic photo resist material.;CONSTITUTION: A feeding unit is composed in order to receive a non-Newtonian fluid. The non-newtonian fluid has a breakdown point higher than shear stress applied to the non-newtonian fluid. The non-Newtonian fluid is provided to the surface of a substrate. Plug flow is defined by uniform speed flow profile. The speed of the non-Newtonian fluid contacted to the pipe wall is approached to the speed of the non-Newtonian fluid in the middle of the pipe.;COPYRIGHT KIPO 2012
机译:目的:提供一种使用非牛顿流体清洁基板的方法和设备,通过将臭氧与去离子水和有机光致抗蚀剂材料结合使用,轻松地从基板表面去除光致抗蚀剂材料。为了接收非牛顿流体而构成。非牛顿流体的击穿点高于施加于非牛顿流体的切应力。非牛顿流体被提供到基板的表面。塞流由均匀的速度流曲线定义。非牛顿流体与管壁接触的速度接近管道中间的非牛顿流体的速度。; COPYRIGHT KIPO 2012

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