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POSITIVE TYPE RESIST COMPOSITION AND A METHOD FOR FORMING A RESIST PATTERN CAPABLE OF BEING BASED ON A RESIN COMPONENT WITH A STRUCTURAL UNIT OF A SPECIFIC STRUCTURE AND A STRUCTURAL UNIT CONTAINING AN ACID-LABILE DISSOLUTION SUPPRESSING GROUP
POSITIVE TYPE RESIST COMPOSITION AND A METHOD FOR FORMING A RESIST PATTERN CAPABLE OF BEING BASED ON A RESIN COMPONENT WITH A STRUCTURAL UNIT OF A SPECIFIC STRUCTURE AND A STRUCTURAL UNIT CONTAINING AN ACID-LABILE DISSOLUTION SUPPRESSING GROUP
PURPOSE: A positive type resist composition and a method for forming a resist pattern are provided to improve the lithographic characteristic, pattern shapes, the resolution, and the contrast of the composition.;CONSTITUTION: A positive type resist composition includes a base component(A'). The dissolution of the A' with respect to an alkali developing solution is increase by the action of acid. The A' contains a resin component(A1) with a structural unit(a0-1) and a structural unit(a1). The a0-1 is represented by chemical formula 1. The a1 contains an acid-labile dissolution suppressing group. In the chemical formula 1, the R1 is hydrogen atom, C1 to C5 alkyl group, or C1 to C5 halogenated alkyl group. The R2 is single bond or divalent coupling agent. The R3 is cyclic group containing -SO_2-.;COPYRIGHT KIPO 2012
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