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METHOD FOR MANUFACTURING MICROCRYSTALLINE SILICON FILM, MICROCRYSTALLINE SILICON FILM, ELECTRIC ELEMENT, AND DISPLAY DEVICE
METHOD FOR MANUFACTURING MICROCRYSTALLINE SILICON FILM, MICROCRYSTALLINE SILICON FILM, ELECTRIC ELEMENT, AND DISPLAY DEVICE
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机译:制造微晶硅膜,微晶硅膜,电子元件和显示装置的方法
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摘要
Disclosed is a method for manufacturing a crystalline silicon film, which is provided with: a step of preparing a substrate (1) having the main surface; a step of forming an amorphous film (2) on the main surface; and a step of exposing, in an atmosphere having no electrical field applied thereto, the substrate having the amorphous film (2) formed thereon to a gas atmosphere of a first silicon compound containing silicon element and hydrogen element as main components.
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