首页> 外国专利> Compact multi-focus x-ray source, x-ray diffraction imaging system, and method for fabricating compact multi-focus x-ray source

Compact multi-focus x-ray source, x-ray diffraction imaging system, and method for fabricating compact multi-focus x-ray source

机译:紧凑型多焦点x射线源,x射线衍射成像系统以及制造紧凑型多焦点x射线源的方法

摘要

A multi-focus x-ray source (MFXS) for a multiple inverse fan beam x-ray diffraction imaging (MIFB XDI) system. The MFXS (12) includes a plurality of focus points (54) defined along a length of the MFXS collinear with the y-axis (58). The MFXS (12) is configured to generate the plurality of primary beams (60), and at least M coherent x-ray scatter detectors (24) are configured to detect coherent scatter rays from the primary beams as the primary beams propagate through a section of the object positioned within the examination area (14) when a spacing P between adjacent coherent x-ray scatter detectors satisfies the equation: P=Ws⋅VM⋅U,where Ws is a lateral extent of the plurality of focus points (54), U is a distance from the y-axis (58) to a top surface of the examination area, and V is a distance from the top surface to the line at the coordinate X = L.
机译:用于多重反向扇形束X射线衍射成像(MIFB XDI)系统的多焦点X射线源(MFXS)。 MFXS(12)包括沿着MFXS的与y轴(58)共线的长度限定的多个焦点(54)。 MFXS(12)被配置为产生多个主光束(60),并且至少M个相干x射线散射检测器(24)被配置为当主光束传播通过截面时从主光束检测相干散射射线。当相邻相干x射线散射检测器之间的间距P满足以下公式时,位于检查区域(14)内的物体的角度:P = Ws·VM·U,其中Ws是多个焦点(54)的横向范围,U是从y轴(58)到检查区域顶表面的距离,V是从顶表面到直线上的线的距离坐标X =L。

著录项

  • 公开/公告号EP2221847A3

    专利类型

  • 公开/公告日2012-01-11

    原文格式PDF

  • 申请/专利权人 MORPHO DETECTION INC.;

    申请/专利号EP20100001613

  • 发明设计人 HARDING GEOFFREY;

    申请日2010-02-17

  • 分类号H01J35/02;G01V5/00;

  • 国家 EP

  • 入库时间 2022-08-21 17:15:53

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