首页> 外国专利> X-RAY DIFFERENTIAL PHASE CONTRAST IMAGING USING A TWO-DIMENSIONAL SOURCE GRATING WITH PINHOLE APERTURES AND TWO-DIMENSIONAL PHASE AND ABSORPTION GRATINGS

X-RAY DIFFERENTIAL PHASE CONTRAST IMAGING USING A TWO-DIMENSIONAL SOURCE GRATING WITH PINHOLE APERTURES AND TWO-DIMENSIONAL PHASE AND ABSORPTION GRATINGS

机译:X射线微分相衬成像的二维源光栅与针孔和二维相和吸收光栅。

摘要

An x-ray differential phase contrast imaging apparatus includes an x-ray source, a source grating, a diffraction grating diffracting x-rays from the x-ray source and source grating and a detector detecting x-rays from the diffraction grating, wherein the source grating includes first x-ray transmissive apertures transmitting x-rays to thereby form a first interference pattern by being diffracted at the diffraction grating, and second x-ray transmissive apertures transmitting x-rays to thereby form a second interference pattern by being diffracted at the diffraction grating, wherein the first and second x-ray transmissive apertures are pinhole apertures which are disposed so that at least part of the first and second interference pattern overlap and the positions of x-ray regions in the first interference pattern differ from the positions of x-ray regions in the second interference pattern, and wherein a combined pattern is formed by the first interference pattern and the second interference pattern.
机译:X射线差分相衬成像设备包括:X射线源,源光栅,衍射来自X射线源和源光栅的X射线的衍射光栅,以及检测来自衍射光栅的X射线的检测器,其中源光栅包括透射x射线的第一x射线透射孔,从而通过在衍射光栅处衍射而形成第一干涉图案,以及透射x射线的第二x射线透射孔,从而通过在x射线处衍射而形成第二干涉图案。衍射光栅,其中,第一和第二X射线透射孔是针孔,其被布置为使得第一和第二干涉图案的至少一部分重叠并且第一干涉图案中的X射线区域的位置不同于该位置。第二干涉图案中的X射线区域的数量,其中由第一干涉图案和第二界面形成组合图案回归模式。

著录项

  • 公开/公告号WO2012032950A1

    专利类型

  • 公开/公告日2012-03-15

    原文格式PDF

  • 申请/专利权人 CANON KABUSHIKI KAISHA;NAGAI KENTARO;

    申请/专利号WO2011JP69368

  • 发明设计人 NAGAI KENTARO;

    申请日2011-08-23

  • 分类号G01N23/04;

  • 国家 WO

  • 入库时间 2022-08-21 17:17:14

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