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PHOTOLITHOGRAPHIC METHOD INCLUDING MEASUREMENT OF THE LATENT IMAGE

机译:光照相法,包括隐性图像的测量

摘要

The contactless nondestructive method for checking and correcting the exposure pattern based upon measurement of the latent image pattern formed in a resist prior to development (figure 1b). The process may be used with various photoresists to form patterns useful as stampers or molds for optical disks, optical cards, diffractive optics and other minute articles. The method includes illumination of the latent image with light which the photoresist is not sensitive to and measurement of the polarization of that light before and after interacting with exposed and unexposed areas of the photoresist.
机译:一种非接触式非破坏性方法,用于基于显影前在抗蚀剂中形成的潜像图案的测量来检查和校正曝光图案(图1b)。该方法可以与各种光致抗蚀剂一起使用,以形成用作光盘,光卡,衍射光学器件和其他微小物品的压模或模具的图案。该方法包括用光致抗蚀剂不敏感的光照射潜像,以及在与光致抗蚀剂的曝光和未曝光区域相互作用之前和之后对该光的偏振进行测量。

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