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Method for computing the sensitivity of a VLSI design to both random and systematic defects using a critical area analysis tool

机译:使用临界面积分析工具计算VLSI设计对随机缺陷和系统缺陷的敏感性的方法

摘要

A method of estimating integrated circuit yield comprises providing an integrated circuit layout and a set of systematic defects based on a manufacturing process. Next, the method represents a systematic defect by modifying structures in the integrated circuit layout to create modified structures. More specifically, for short-circuit-causing defects, the method pre-expands the structures when the structures comprise a higher systematic defect sensitivity level, and pre-shrinks the structures when the structures comprise a lower systematic defect sensitivity level. Following this, a critical area analysis is performed on the integrated circuit layout using the modified structures, wherein dot-throwing, geometric expansion, or Voronoi diagrams are used. The method then computes a fault density value, random defects and systematic defects are computed. The fault density value is subsequently compared to a predetermined value, wherein the predetermined value is determined using test structures and/or yield data from a target manufacturing process.
机译:一种估计集成电路成品率的方法,包括基于制造过程提供集成电路布局和一组系统缺陷。接下来,该方法通过修改集成电路布局中的结构以创建修改后的结构来表示系统缺陷。更具体地,对于引起短路的缺陷,该方法在结构具有较高的系统缺陷敏感性水平时对结构进行预膨胀,并且在结构具有较低的系统缺陷敏感性水平时对结构进行预收缩。此后,使用修改后的结构对集成电路布图进行关键区域分析,其中使用点抛图,几何展开图或Voronoi图。该方法然后计算故障密度值,计算随机缺陷和系统缺陷。随后将故障密度值与预定值进行比较,其中使用测试结构和/或来自目标制造过程的良率数据确定预定值。

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