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Multiple-gate MOS transistor using Si substrate and method of manufacturing the same

机译:使用Si衬底的多栅MOS晶体管及其制造方法

摘要

Provided are a multiple-gate MOS (metal oxide semiconductor) transistor and a method of manufacturing the same. The transistor includes a single crystalline active region having a channel region having an upper portion of a streamlined shape (∩) obtained by patterning an upper portion of a bulk silicon substrate with an embossed pattern, and having a thicker and wider area than the channel region; a nitride layer formed at both side surfaces of the single crystalline active region to expose an upper portion of the single crystalline active region at a predetermined height; and a gate electrode formed to be overlaid with the exposed upper portion of the single crystalline active region of the channel region.
机译:提供了一种多栅MOS(金属氧化物半导体)晶体管及其制造方法。该晶体管包括单晶有源区,该单晶有源区具有沟道区,该沟道区具有通过以浮雕图案对块状硅衬底的上部进行图案化而获得的流线形(∩)的上部,并且具有比沟道区更厚和更宽的面积。 ;氮化物层形成在单晶有源区的两个侧表面上,以预定高度暴露单晶有源区的上部;栅电极形成为与沟道区的单晶有源区的暴露的上部重叠。

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