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Broad stripe semiconductor laser device and a broad stripe semiconductor laser array using the same, and method for producing a broad stripe semiconductor laser device

机译:宽带半导体激光器件和使用该宽带半导体激光器件的宽带半导体激光器阵列,以及用于制造宽带半导体激光器件的方法

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor laser element capable of ensuring high output operation by providing a window region and of improving the shape accuracy of a protruded striped part and reproducibility in a manufacturing process.;SOLUTION: The width W1 of the protruded striped part 20 in an end face neighborhood region 30A including a window region 30 is made larger than the width W2 in an element internal region 30B other than the end face neighborhood region 30A. The protruded striped part 20 is not extended in the end face neighborhood region 30A including the window structure 30, and a p-type third clad layer 17 is left behind. Also, when there is provided the window region 30 for high output power, it is possible to improve the shape accuracy of the protruded striped part 20 in the end face neighborhood region 30A including the window region 30 to stabilize a horizontal transverse mode and reduce a transverse beam radiation angle.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种半导体激光器元件,该半导体激光器元件能够通过提供窗口区域来确保高输出操作,并且能够改善凸条形部件的形状精度以及制造过程中的再现性。使得包括窗口区域30的端面邻近区域30A中的部分20大于除端面邻近区域30A之外的元件内部区域30B中的宽度W2。突出的条纹部分20在包括窗口结构30的端面邻域30A中不延伸,并且留下p型第三包层17。此外,当设置用于高输出功率的窗口区域30时,可以提高包括窗口区域30的端面附近区域30A中的突出条纹部分20的形状精度,以稳定水平横向模式并减小横束辐射角。;版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP4904682B2

    专利类型

  • 公开/公告日2012-03-28

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP20040312625

  • 发明设计人 今西 大介;佐藤 典文;

    申请日2004-10-27

  • 分类号H01S5/16;

  • 国家 JP

  • 入库时间 2022-08-21 17:36:15

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