首页> 外国专利> The S alkyl which is shown with the below-mentioned chemical structure formula S alkyl in the electroless deposition preprocessing medicine which consists of the triazine thiol

The S alkyl which is shown with the below-mentioned chemical structure formula S alkyl in the electroless deposition preprocessing medicine which consists of the triazine thiol

机译:在由三嗪硫醇组成的化学沉积预处理药物中,具有下述化学结构式S烷基所示的S烷基

摘要

PROBLEM TO BE SOLVED: To provide an electroless plating pretreatment agent capable of forming a plating film excellent in adhesiveness to a resin.;SOLUTION: The electroless plating pretreatment agent consists of an S-alkyl-substituted triazinethiol derivative represented by the chemical structural formula (wherein R1 is a monovalent element such as H, Li, Na, or K; R2 is a monovalent element such as H, Li, Na, or K or an alkyl group; and R3 is an alkyl group).;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种能够形成对树脂的粘附性优异的镀膜的化学镀预处理剂。解决方案:该化学镀预处理剂由化学结构式表示的S-烷基取代的三嗪硫醇衍生物组成(其中R 1 是单价元素,例如H,Li,Na或K; R 2 是单价元素,例如H,Li,Na或K或烷基; R 3 是烷基).;版权:(C)2007,JPO&INPIT

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