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PHOTOSENSITIVE RESIN COMPOSITION WHICH HAS ADVANCED PATTERN ADHESION AND DEVELOPING PROPERTY

机译:具有先进的图案附着力和开发性能的光敏树脂组合物

摘要

PURPOSE: A photoresist resin composition is provided to secure the fast development property and the adhesion force with a lower substrate, and to improve the dispersion stability of a mordant composition. CONSTITUTION: A photoresist resin composition contains the following: 20~80wt% of multi-functional monomer with 1~4 unsaturated double bonds as a multi-functional monomer; and 80~20wt% of multi-functional monomer with 5~6 unsaturated double bonds. The multi-functional monomer with 5~6 unsaturated double bonds is selected from the group consisting of penthaerithritol tetra(meta)acrylate, dipentaerythritol penta(meta)acrylate, and dipentaerythritol hexa(meta)acrylate.
机译:目的:提供一种光致抗蚀剂树脂组合物,以确保其快速显影性能和与较低基材的粘附力,并改善媒染剂组合物的分散稳定性。组成:一种光致抗蚀剂树脂组合物,其包含:20〜80wt%的具有1〜4个不饱和双键的多官能单体作为多官能单体。 80〜20wt%的具有5〜6个不饱和双键的多官能单体。具有5〜6个不饱和双键的多功能单体选自季戊四醇四(甲基)丙烯酸酯,二季戊四醇五(甲基)丙烯酸酯和二季戊四醇六(甲基)丙烯酸酯。

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