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applicator for applying antiseptic solution and selectively removing unwanted by-products from antiseptic solution and process for selectively removing unwanted by-products from antiseptic solution
applicator for applying antiseptic solution and selectively removing unwanted by-products from antiseptic solution and process for selectively removing unwanted by-products from antiseptic solution
APPLICATOR FOR APPLYING ANTI-SEPTIC SOLUTION AND SELECTIVELY REMOVING UNWANTED SUB-PRODUCTS FROM THE ANTI-SEPTIC SOLUTION AND PROCESS TO REMOVAL SELECTIVELY UNWANTED SUB-PRODUCTS FROM ANTI-SEPTIC SOLUTION The present invention refers, in a general way, to a process and, in general, the present invention relates unwanted chemicals, such as parachloroanhline (PCA), an antiseptic solution. More specifically, the applicator includes an antiseptic solution, in an amount sufficient to be applied to an unwanted by-product and to have an antimicrobial effect on the unwanted by-product, and a porous element. The porous element selectively removes unwanted by-products from the antiseptic solution, when the antiseptic solution contacts at least one porous element.
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