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PROCESS FOR EMISSION OF PULSED LASER RADIATION AND ASSOCIATED LASER SOURCE
PROCESS FOR EMISSION OF PULSED LASER RADIATION AND ASSOCIATED LASER SOURCE
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机译：脉冲激光辐射及相关激光源的发射过程
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摘要
The present invention especially concerns the field of lasers. Specifically, the object of the invention is a process for the emission of pulsed laser radiation generated by at least one laser crystal which is located in a cavity containing a first and a second mirror and pumped by des pumping means, wherein said process includes a first stage which consists of generating a first pumping laser radiation with an intensity of Jc which is capable of bringing the crystal at least to the laser emission threshold and a second stage which consists of generating a second pumping laser radiation with an intensity of Jp in the form of a step, whereby said second radiation is superimposed, at least in part, on said first radiation or immediately succeeds it, and whereby the intensity Jp, in the latter case, is greater than the intensity Jc of said first radiation, as well as a laser source capable of activating said process.
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机译：本发明尤其涉及激光领域。具体地，本发明的目的是一种用于发射由至少一个激光晶体产生的脉冲激光辐射的方法，该至少一个激光晶体位于包含第一和第二反射镜的腔中并且由去泵浦装置泵浦，其中，所述过程包括第一第二阶段包括产生强度为J c 的第一泵浦激光辐射，第二阶段包括产生第二泵浦激光辐射，该第一泵浦激光辐射的强度至少能够使晶体达到激光发射阈值具有阶梯形式的强度J p ，其中所述第二辐射至少部分地叠加在所述第一辐射上或紧随其后，并且强度J p在后一种情况下，大于所述第一辐射以及能够激活所述过程的激光源的强度J c 。
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