首页> 外国专利> In the manner of deflecting the collimate mirror in the illumination optical system of the exposure device which it makes parallel luminous flux with the collimate mirror which

In the manner of deflecting the collimate mirror in the illumination optical system of the exposure device which it makes parallel luminous flux with the collimate mirror which

机译:以使准直镜在曝光装置的照明光学系统中偏转的方式,与准直镜使光束平行。

摘要

PPROBLEM TO BE SOLVED: To provide a method of deflecting a collimating mirror in an illumination optical system of an exposure device which can make a collimating mirror light in weight, by thinning the thickness of the collimating mirror, even if the extent of one edge of a rectangle of the collimating mirror becomes several thousands of millimeters, adequately deflects the collimating mirror, with the assumption on the relation between the thickness of the collimating mirror and the length of the edge, and permits high-accuracy exposure that causes less distortion aberrations, and to provide an illumination optical system for an exposure device obtained by the deflection method of the collimating mirror. PSOLUTION: In the method of deflecting the collimating mirror in the illumination optical system of the exposure device, the luminous flux of exposure light rays from an illumination light source is made into parallel luminous flux by the deflected collimating mirror, and a pattern of a mask is transferred to an object to be transferred by the exposure light rays. The collimating mirror is deflected mechanically on the assumption of the relation between the thickness of the collimating mirror, and the length of the edge and the distortion aberrations of the parallel luminous flux are corrected. For example, assuming the relation between the thickness of the collimating mirror and the length of the edge, the collimating mirror is pressed and deflected upward or downward, with respect to the surface of the collimating mirror and is deformed to correct the distortion aberrations of the parallel luminous flux. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种使曝光装置的照明光学系统中的准直镜偏转的方法,该方法可以通过使准直镜的厚度变薄而使准直镜的重量变轻,即使准直镜的矩形的一个边缘变成几千毫米,假设准直镜的厚度和边缘的长度之间的关系,使准直镜充分偏转,并允许进行高精度曝光,从而减少提供一种用于通过准直镜的偏转方法获得的用于曝光装置的照明光学系统。

解决方案:在使曝光装置的照明光学系统中的准直镜偏转的方法中,通过偏转的准直镜使来自照明光源的曝光光线的光束成为平行光束,并形成图案。掩模的光通过曝光光线被转印到要被转印的物体上。在准直镜的厚度之间的关系的假设下,准直镜被机械地偏转,并且边缘的长度和平行光通量的畸变像差被校正。例如,假设准直镜的厚度与边缘的长度之间的关系,则将准直镜相对于准直镜的表面按压或向上或向下偏转,并且变形以校正镜面的畸变像差。平行光通量。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP4598793B2

    专利类型

  • 公开/公告日2010-12-15

    原文格式PDF

  • 申请/专利权人 株式会社トプコン;

    申请/专利号JP20070087362

  • 发明设计人 内田 直樹;榎本 芳幸;

    申请日2007-03-29

  • 分类号G03F7/20;H01L21/027;G02B5/10;

  • 国家 JP

  • 入库时间 2022-08-21 18:17:50

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