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METHOD OF FORMING TRANSPARENT PHOTOOXIDATION LAYER THIN FILM
METHOD OF FORMING TRANSPARENT PHOTOOXIDATION LAYER THIN FILM
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机译：形成透明光氧化层薄膜的方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for forming a thin film having a large-area, which has rich electric insulation, is transparent in the whole wavelength region and is excellent in heat resistance and water resistance, in a short time, when the film is formed by photooxidation of silicone oil.;SOLUTION: The method for controlling a saturated vapor pressure of an oxidant while constantly monitoring the photooxidation reaction during photo excitation, and a vacuum ultraviolet light source for effectively performing the photooxidation reaction are provided in order to store or supply the oxidant into silicone oil neither too much nor too little. A sample and a reaction atmosphere are cooled, the oxidant in the silicone oil is suppressed to the saturated vapor pressure or less, further, in order to prevent both of heat generation of the vacuum ultraviolet light source and oxidation of a reflection mirror or an electrode, the reflection mirror and the electrode are integrated and the interior of the reflection mirror and the electrode is cooled. At the same time, the reflection mirror and outer walls of lamp discharge pipes are photo-adhered with the silicone oil, and a fluorescent agent layer which is sensed in the vacuum ultraviolet ray wavelength region is laid on the back surface of the sample, thereby, the proceeding process of the photooxidation reaction is monitored depending on the light emission intensity and the feeding control of the oxidant and the control of excitation light are performed.;COPYRIGHT: (C)2011,JPO&INPIT
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