首页> 外国专利> LIGHT SOURCE GRATING, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE EQUIPPED WITH THE SOURCE GRATING, AND X-RAY COMPUTED TOMOGRAPHY SYSTEM

LIGHT SOURCE GRATING, IMAGING APPARATUS FOR X-RAY PHASE CONTRAST IMAGE EQUIPPED WITH THE SOURCE GRATING, AND X-RAY COMPUTED TOMOGRAPHY SYSTEM

机译:光源光栅,配备该光源光栅的X射线相衬图像成像装置以及X射线计算机断层摄影系统

摘要

PROBLEM TO BE SOLVED: To provide a light source grating which enables a period to be changed in response to an imaging condition without the need of preparing two or more light source gratings beforehand.;SOLUTION: This light source grating is disposed between an electromagnetic wave source and imaging system, and is used when an electromagnetic wave emitted from the electromagnetic wave source is spatially split into two or more beams. The light source grating is configured by laminating a first substrate equipped with two or more openings and a second substrate equipped with two or more openings, and has an opening array by a two dimensional array formed of the two or more openings in the overlap between the first substrate and second substrate. The light source grating is configured to change the period of the opening array by the two dimensional array from a first period to a second period different from the first period by changing the relative position between the first substrate and second substrate in the planar direction.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种光源光栅,该光栅能够根据成像条件改变周期,而无需事先准备两个或多个光源光栅。解决方案:该光源光栅设置在电磁波之间源和成像系统,并且当从电磁波源发出的电磁波在空间上分成两个或更多束时使用。光源光栅通过层叠具有两个或更多个开口的第一基板和具有两个或更多个开口的第二基板而构成,并且具有由由两个或更多个开口形成的二维阵列的开口阵列,该二维阵列由两个或更多个开口形成。第一基板和第二基板。光源光栅被配置为通过改变第一基板和第二基板之间在平面方向上的相对位置,来将二维阵列的开口阵列的周期从第一周期改变为不同于第一周期的第二周期。版权所有:(C)2011,日本特许厅和INPIT

著录项

  • 公开/公告号JP2011153869A

    专利类型

  • 公开/公告日2011-08-11

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20100014618

  • 发明设计人 SATO GENTA;NAKAMURA TAKASHI;

    申请日2010-01-26

  • 分类号G21K5/00;G21K1/02;A61B6/00;A61B6/06;G21K1/04;G21K1/00;G21K5/02;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:38

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