首页> 外国专利> Scattering parameters measuring method for device under test, involves determining scattering parameters of device under test, determining differences between measured wave frequencies and executing correction calculation

Scattering parameters measuring method for device under test, involves determining scattering parameters of device under test, determining differences between measured wave frequencies and executing correction calculation

机译:被测器件的散射参数测量方法,包括确定被测器件的散射参数,确定被测波频率之间的差异并执行校正计算

摘要

The method involves feeding measuring signals into respective measuring gates (40, 41). Wave frequencies (a1) of moving-away waves and wave frequencies (b1, b2) of moving-back waves are measured. The corrected wave frequencies are determined based on a correction calculation. The scattering parameters of a device under test (42) are determined from the determined corrected wave frequencies. The differences between the measured wave frequencies are determined before correction calculation. The correction calculation is executed based on the determined differences. An independent claim is also included for a scattering parameters measuring device comprising a transmission unit.
机译:该方法包括将测量信号馈送到相应的测量门(40、41)。测量移开波的波频率(a1)和移回波的波频率(b1,b2)。根据校正计算确定校正后的波频率。根据确定的校正波频率确定被测设备(42)的散射参数。在校正计算之前确定测量的波频率之间的差异。基于所确定的差异来执行校正计算。对于包括传输单元的散射参数测量装置也包括独立权利要求。

著录项

  • 公开/公告号DE102008027033A1

    专利类型

  • 公开/公告日2009-12-10

    原文格式PDF

  • 申请/专利权人 ROHDE & SCHWARZ GMBH & CO. KG;

    申请/专利号DE20081027033

  • 发明设计人 LEIBFRITZ MARTIN;HELD WERNER;

    申请日2008-06-06

  • 分类号G01R27/28;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:59

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