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Apparatus for surface treatment with plasma in atmospheric pressure having parallel plates type electrode structure

机译:具有平行板型电极结构的常压等离子体表面处理装置

摘要

An atmospheric pressure plasma surface processing apparatus having a parallel flat type electrode structure and a surface processing method thereof are provided to process efficiently surfaces of chemical active species by preventing damage due to charged particles. An atmospheric pressure plasma surface processing apparatus(100) having a parallel flat type electrode structure includes a power electrode and lower grounding electrodes(31,32). The power electrode receives a voltage. The lower grounding electrodes are installed under the power electrode. The lower grounding electrodes are opposite to the power electrode in order to form lower plasma generation spaces(41,42). A plurality of outlets(53) are formed at the lower grounding electrodes in order to discharge the plasma and the processing gas. The thickness of the lower grounding electrode is 3-50mm.
机译:提供具有平行的扁平型电极结构的大气压等离子体表面处理设备及其表面处理方法,以通过防止由于带电粒子引起的损坏而有效地处理化学活性物质的表面。具有平行平板型电极结构的大气压等离子体表面处理装置(100)包括电源电极和下部接地电极(31,32)。功率电极接收电压。下接地电极安装在功率电极下方。下部接地电极与电源电极相对,以形成下部等离子体产生空间(41,42)。在下部接地电极处形成多个出口(53),以排放等离子体和处理气体。下接地电极的厚度为3-50mm。

著录项

  • 公开/公告号KR100988291B1

    专利类型

  • 公开/公告日2010-10-18

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20080007915

  • 发明设计人 노태협;석동찬;유승열;

    申请日2008-01-25

  • 分类号H05H1/24;H05H1/46;H05H1/34;

  • 国家 KR

  • 入库时间 2022-08-21 18:30:43

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