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MANUFACTURING METHOD OF CRYSTALLINE SUBSTRATE, CAPABLE OF MINIMIZING DEFECTS IN A SUBSTRATE, A CRYSTALLINE SUBSTRATE MANUFACTURED USING THE SAME, A LIGHT EMITTING DEVICE INCLUDING A CRYSTALLINE SUBSTRATE AND A MANUFACTURING METHOD THEREOF
MANUFACTURING METHOD OF CRYSTALLINE SUBSTRATE, CAPABLE OF MINIMIZING DEFECTS IN A SUBSTRATE, A CRYSTALLINE SUBSTRATE MANUFACTURED USING THE SAME, A LIGHT EMITTING DEVICE INCLUDING A CRYSTALLINE SUBSTRATE AND A MANUFACTURING METHOD THEREOF
PURPOSE: A manufacturing method of crystalline substrate, a crystalline substrate manufactured using the same, a light emitting device including a crystalline substrate, and a manufacturing method thereof are provided to obtain a uniform surface of a gallium nitride single crystal substrate using an electric potential prevention layer.;CONSTITUTION: A lower epi layer(12) is formed on a base substrate(10). A part of an electric potential region within the lower epi layer is selectively removed. Accordingly, an electric potential prevention layer is formed within the electric potential region. A top epi layer(18) is formed on the lower epi layer. The electric potential region is selectively removed using the dry etch or the wet etch process.;COPYRIGHT KIPO 2010
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