首页> 外国专利> COATER FOR DEVELOPER SOLUTION CAPABLE OF PREVENTING ADJACENT DEVELOPER SOLUTIONS FROM STICKING EACH OTHER BY SURFACE TENSION

COATER FOR DEVELOPER SOLUTION CAPABLE OF PREVENTING ADJACENT DEVELOPER SOLUTIONS FROM STICKING EACH OTHER BY SURFACE TENSION

机译：可以通过表面张力防止其他开发商解决方案的开发商解决方案的涂层

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摘要

PURPOSE: A coater for a developer solution is provided to discharge bubbles through a bubble outlet rapidly, and to prevent generation of a stain by spreading the developer solution uniformly on the whole substrate at a constant interval.;CONSTITUTION: A coater for a developer solution includes the followings: a housing(1) formed to be corresponded to a substrate; a plurality of developer supply holes(16) connected with a developer supply part to supply the developer solution; a developer storage part(25) storing the developer solution, and equipped on the housing; a developer discharge part(15) discharging the developer solution to the substrate; and a discharge unit installed at the bottom of the developer discharge part.;COPYRIGHT KIPO 2010

机译：用途：提供显影剂溶液涂布机，以通过气泡出口快速排出气泡，并通过以恒定间隔将显影剂溶液均匀地分散在整个基材上来防止污点的产生;组成：显影剂溶液涂布机包括以下内容：形成为与基板相对应的壳体（1）;多个显影剂供应孔（16），其与显影剂供应部连接以供应显影剂溶液。显影剂存储部分（25），其存储显影剂溶液，并安装在壳体上;显影剂排出部（15），将显影剂溶液排出到基板上。 ;以及在显影剂排放部分底部安装的排放单元。; COPYRIGHT KIPO 2010

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公开/公告号KR20090132310A

专利类型
公开/公告日2009-12-30

原文格式PDF
申请/专利权人 DMS CO. LTD.;
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申请/专利号KR20080058509
发明设计人 LEE SEUNG JUN;PARK HO YOUN;
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申请日2008-06-20
分类号B05B1/14;
国家 KR
入库时间 2022-08-21 18:33:48

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