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Magnetoresistance effect element comprising nano-contact portion not more than a mean free path and magnetic head utilizing same

机译:具有不超过平均自由程的纳米接触部分的磁阻效应元件和利用该元件的磁头

摘要

A magnetoresistance effect element comprises a free layer composed of a ferromagnetic layer, a pinned layer composed of a ferromagnetic layer, and a layer disposed between the free layer and the pinned layer and including at least one nano-contact portion disposed at least one portion between the free layer and the pinned layer. The nano-contact portion has a dimension, including at least one of a length in the layer lamination direction and a length in a direction normal to the layer lamination direction, being not more than Fermi length. The nano-contact portion is provided, in an inside portion thereof, with a magnetic wall composed of either one of Bloch magnetic wall, Nëel magnetic wall or a combination wall thereof.
机译:磁阻效应元件包括:由铁磁层构成的自由层;由铁磁层构成的被钉扎层;以及布置在该自由层和被钉扎层之间并且包括至少一个纳米接触部分的层,该至少一个纳米接触部分被布置在该层之间。自由层和固定层。纳米接触部具有至少包括费米长度的尺寸,该尺寸包括在层层叠方向上的长度和在垂直于层层叠方向的方向上的长度中的至少之一。纳米接触部分在其内部设置有由Bloch磁性壁,Nel磁性壁或它们的组合壁之一构成的磁性壁。

著录项

  • 公开/公告号US7733611B2

    专利类型

  • 公开/公告日2010-06-08

    原文格式PDF

  • 申请/专利权人 ISAMU SATO;RACHID SBIAA;

    申请/专利号US20070679814

  • 发明设计人 RACHID SBIAA;ISAMU SATO;

    申请日2007-02-27

  • 分类号G11B5/39;

  • 国家 US

  • 入库时间 2022-08-21 18:48:07

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