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Method for defect detection and process monitoring based on SEM images

机译:基于SEM图像的缺陷检测与过程监控方法

摘要

A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image. The defect is detected by subtraction of the idealized image from the original image. Morphological operations are used also to entrance the visibility of defects or to check for irregularities in patterns. Other described methods comprise: growing a flow from seed points in the image, in order to define maps in which particles can be identified; checking for separation of objects in the image by growing flows from seed points located on the objects; segmenting the image into supposed identical objects and applying statistical methods to identify the defective ones.
机译:将形态学操作应用于SEM图像以获得理想化图像,并且理想化图像用于检测SEM图像的对象中的缺陷。通过从原始图像减去理想化图像来检测缺陷。形态学操作还用于确定缺陷的可见性或检查图案中的不规则性。其他描述的方法包括:从图像中的种子点开始增加流量,以定义可识别颗粒的图;通过增加来自位于物体上的种子点的流来检查图像中物体的分离;将图像分割成假定的相同对象,然后应用统计方法来识别有缺陷的对象。

著录项

  • 公开/公告号US7764824B2

    专利类型

  • 公开/公告日2010-07-27

    原文格式PDF

  • 申请/专利权人 LAURENT KARSENTI;

    申请/专利号US20040564846

  • 发明设计人 LAURENT KARSENTI;

    申请日2004-07-15

  • 分类号G06K9/00;

  • 国家 US

  • 入库时间 2022-08-21 18:50:02

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