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Method and apparatus for accessing a process chamber with a dual-zone gas injector with an improved optical access type

机译:用具有改进的光学访问类型的双区域气体注射器访问处理室的方法和设备

摘要

Into the process chamber A1 A injector provides optical access to the axial passage through the optical access window diagnosis end outside the process chamber. Receives a process gas first and second hollow body casing surrounds the axial passage. To minimize the generation of particles, and is prompted for the case body, a sleeve within the body of the case defines the gas holes of first injecting a first process gas into the process chamber. To inject the second process gas into the process chamber, gas in the second bore of the sleeve, makes it possible to surround the axial passage, the optical signal has a signal-to-noise ratio of the desired (SNR) at the end . By providing a septum in the hole in the second method, so as to reduce the deposition on the optical access window on etching and optical access window and to maintain the desired SNR in the diagnosis end, a second hole I is divided into the aperture that is configured to. [Selection Figure] Figure 3A
机译:注入到处理室A1中的喷射器通过处理室外部的光学访问窗口诊断端提供对轴向通道的光学访问。接收过程气体的第一和第二空心壳体围绕轴向通道。为了最小化颗粒的产生并提示壳体,在壳体内的套筒限定了首先将第一处理气体注入处理室的气孔。为了将第二处理气体注入到处理室中,套筒的第二孔中的气体使得可以围绕轴向通道,光信号在末端具有期望的信噪比(SNR)。通过在第二种方法中在孔中提供隔片,以减少蚀刻和光访问窗上的光访问窗上的沉积并在诊断端保持所需的SNR,将第二个孔I划分为配置为。 [选型图]图3A

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