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METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING MODEL BASED COLORING PROCESS FOR PATTERN DECOMPOSITION FOR USE IN MULTIPLE EXPOSURE PROCESS
METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING MODEL BASED COLORING PROCESS FOR PATTERN DECOMPOSITION FOR USE IN MULTIPLE EXPOSURE PROCESS
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机译：用于模型分解的基于模型的着色过程的方法，程序产品和装置，用于多种曝光过程
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摘要
PROBLEM TO BE SOLVED: To provide a method of decomposing a target pattern including features to be imaged onto a substrate into a plurality of exposure patterns for use in a multiple exposure process.;SOLUTION: This method includes: dividing the target pattern into fragments; associating the fragments with an exposure pattern; associating the fragments with ILS evaluation points; and maximizing ILS values. The step of maximizing the ILS values further includes: calculating ILS values at the ILS evaluation points; determining a minimum ILS value; calculating changes in the ILS values as a result of associating fragments with a different exposure pattern; determining a maximum change of the ILS values; and associating fragments associated with the maximum change with a different exposure pattern.;COPYRIGHT: (C)2010,JPO&INPIT
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