首页> 外国专利> NEW DIBLOCK COPOLYMER AND HIGH MOBILITY/PHOTOCONDUCTIVITY ANISOTROPIC NANOWIRE FORMED BY SELF-ASSEMBLING OF THE DIBLOCK COPOLYMER

NEW DIBLOCK COPOLYMER AND HIGH MOBILITY/PHOTOCONDUCTIVITY ANISOTROPIC NANOWIRE FORMED BY SELF-ASSEMBLING OF THE DIBLOCK COPOLYMER

机译:通过自组装二嵌段共聚物形成的新型二嵌段共聚物和高迁移率/光导性各向异性纳米

摘要

PROBLEM TO BE SOLVED: To form a highly ordered nano-structural material having electronic or photovoltaic properties by self-assembling of a newly prepared diblock copolymer.;SOLUTION: The high mobility/photoconductivity anisotropic nanowire is formed by following steps, that is: (i) a step of dissolving the diblock copolymer expressed by formula (1); (ii) a step of depositing the uniform copolymer solution on a substrate; (iii) a step of forming a nanowire directly on the substrate by vaporizing the solvent. (In the formula, R represents a phenyl group, each of (p) and (q) is an integer selected from 1-1,000, D represents porphyrin-containing group of a hydrophilic donor and A is a fullerene-containing group of a hydrophobic acceptor).;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:通过新组装的二嵌段共聚物的自组装形成具有电子或光伏特性的高度有序的纳米结构材料;解决方案:高迁移率/光电导各向异性纳米线通过以下步骤形成,即: i)溶解式(1)表示的二嵌段共聚物的步骤; (ii)将均匀的共聚物溶液沉积在基板上的步骤; (iii)通过蒸发溶剂直接在基板上形成纳米线的步骤。 (式中,R表示苯基,(p)和(q)分别是选自1〜1,000的整数,D表示亲水性供体的含卟啉的基团,A是疏水性的含富勒烯的基团)版权):(C)2010,JPO&INPIT

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