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Illumination device for microlithographic projection exposure system for manufacturing e.g. LCD, has manipulator in connection with light mixing bar producing locally varying contribution for polarization distribution in reticle plane
Illumination device for microlithographic projection exposure system for manufacturing e.g. LCD, has manipulator in connection with light mixing bar producing locally varying contribution for polarization distribution in reticle plane
The device (101) has a light mixing bar (109) causing total reflection of light passed through the light mixing bar when operating the device. A polarization manipulator (113) is arranged before the light mixing bar in a light propagation direction. The manipulator causes asymmetrical manipulation of polarization distribution of the light passed through the manipulator with respect to an optical axis (OA) during operation of the device. The manipulator in connection with the light mixing bar produces a locally varying contribution for the polarization distribution in a reticle plane. Independent claims are also included for the following: (1) a method for manipulation of polarization distribution in an illumination device (2) a method for microlithographic manufacturing of microstructure components.
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