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aluminum etching the underlying substrate used for P (VDF-TrFE) based capacitors and P (VDF-TrFE) based how to improve temperature stability of the capacitor
aluminum etching the underlying substrate used for P (VDF-TrFE) based capacitors and P (VDF-TrFE) based how to improve temperature stability of the capacitor
The etched aluminum bottom electrode having the pattern periodic and nono tophographic is used to improve the high-temperature stability of ferroelectric polarization in the capacitor. The etching aluminum bottom electrode having the nano-size surface structure of periodic and topographical form is used. A (VDF-TrFE) polymer thin film has the sandwich configuration between the different metallic electrodes. In case of using the etching aluminum bottom electrode, the thermal stability increases about 50 deg C and ferroelectricity can be maintained even in annealing of about 185 deg C. The surface of the etched aluminum bottom electrode has periodically the recessed semi-spherical bowl shape of nano-size.
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