首页> 外国专利> RECTANGULAR CATHODIC ARC SOURCE AND METHOD OF STEERING AN ARC SPOT

RECTANGULAR CATHODIC ARC SOURCE AND METHOD OF STEERING AN ARC SPOT

机译:矩形阴极弧源和转向弧斑的方法

摘要

The invention provides an arc coating apparatus having a steering magnetic field source comprising a plurality of electrically independent closed-loop steering conductors disposed in the vicinity of the target surface, each steering conductor being controlled independently of the other steering conductors. Increasing the current through one steering conductor increases the strength of the magnetic field generated by that conductor relative to the steering conductor along the opposite side of the cathode plate, shifting the magnetic field on the opposite side of the cathode plate transversely. Selective unbalancing of the steering conductor currents thus increases the effective breadth of the erosion zone to provide more uniform erosion of the target surface. The steering conductors may be disposed in front of or behind the target surface of the cathode plate. In a further embodiment, groups of steering conductors are disposed along opposite sides of the cathode plate. By selectively applying a current through one conductor in each group, the path of the arc spot shifts to an erosion corridor defined by the active steering conductor. The invention also provides a plurality of internal anodes disposed within the plasma duct, for deflecting the plasma flow and preserving a high ionization level of the plasma. The invention also provides a magnetic focusing system which confines the flow of plasma between magnetic fields generated on opposite sides of the coating chamber. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode, to remove the neutral component of the plasma which otherwise constitutes a contaminant, by disposing the plasma focusing coils in progressively asymmetric relation to the working axis of the cathode, to deflect the flow of plasma along a curvate path toward a substrate holder. The invention also provides a shield at floating potential, restricting the cathode spot from migrating into selected regions of the target evaporation surface outside of the desired erosion zone. The shield may be positioned immediately above the region of the target surface in the vicinity of the anode, protecting the anode from deposition of cathodic evaporate and providing better distribution of cathodic evaporate over the substrates to be coated.
机译:本发明提供了一种电弧涂覆设备,其具有转向磁场源,该转向磁场源包括布置在目标表面附近的多个电独立的闭环转向导体,每个转向导体独立于其他转向导体而被控制。增加通过一个转向导体的电流会增加该导体相对于转向导体沿阴极板相对侧产生的磁场强度,从而使阴极板相对侧的磁场横向移动。转向导体电流的选择性不平衡因此增加了腐蚀区域的有效宽度,以提供对目标表面的更均匀的腐蚀。操纵导体可以设置在阴极板的目标表面的前面或后面。在另一个实施例中,多组转向导体沿着阴极板的相对侧设置。通过有选择地在每组中的一个导体上施加电流,电弧点的路径转移到由主动操纵导体定义的腐蚀通道。本发明还提供了设置在等离子体管道内的多个内部阳极,用于偏转等离子体流并保持等离子体的高电离水平。本发明还提供了一种磁聚焦系统,其将等离子体流限制在在涂覆室的相对侧上产生的磁场之间。通过将等离子聚焦线圈相对于阴极的工作轴逐渐不对称地放置,等离子聚焦系统可用于使等离子流偏离阴极的工作轴,以除去否则构成污染物的等离子中性成分。阴极,以使等离子体流沿着弯曲路径向着基板支架偏转。本发明还提供了一种处于浮动电位的屏蔽罩,该屏蔽罩限制了阴极斑点迁移到期望腐蚀区域之外的目标蒸发表面的选定区域中。屏蔽物可以被放置在阳极附近的靶表面的区域的正上方,从而保护阳极免受阴极蒸发物的沉积,并提供阴极蒸发物在待涂覆基材上的更好分布。

著录项

  • 公开/公告号CA2268659C

    专利类型

  • 公开/公告日2008-12-30

    原文格式PDF

  • 申请/专利权人 GOROKHOVSKY VLADIMIR I.;

    申请/专利号CA19992268659

  • 发明设计人 GOROKHOVSKY VLADIMIR I.;

    申请日1999-04-12

  • 分类号C23C14/35;C23C14/22;C23C14/32;H01J37/32;

  • 国家 CA

  • 入库时间 2022-08-21 19:23:42

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号