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DESIGN PATTERN CORRECTING METHOD, DESIGN PATTERN FORMING METHOD, PROCESS PROXIMITY EFFECT CORRECTING METHOD, SEMICONDUCTOR DEVICE AND DESIGN PATTERN CORRECTING PROGRAM
DESIGN PATTERN CORRECTING METHOD, DESIGN PATTERN FORMING METHOD, PROCESS PROXIMITY EFFECT CORRECTING METHOD, SEMICONDUCTOR DEVICE AND DESIGN PATTERN CORRECTING PROGRAM
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机译：设计图案校正方法，设计图案形成方法，过程接近效果校正方法，半导体器件和设计图案校正程序
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摘要
A design pattern correcting method of correcting a design pattern in relation to a minute step of the design pattern, is disclosed, which comprises extracting at least one of two edges extended from a vertex of the design pattern, measuring a length of the extracted edge, determining whether or not the length of the measured edge is shorter than a predetermined value, extracting two vertexes connected to the extracted edge if it is determined that the length of the extracted edge is shorter than the predetermined value, and reshaping the design pattern to match positions of the two extracted vertexes with each other.
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