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Optical integrator for an illumination system of a microlithography projection exposure installation, has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane, which runs parallel to optical axis
Optical integrator for an illumination system of a microlithography projection exposure installation, has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane, which runs parallel to optical axis
The optical integrator has two micro lenses with breaking surfaces, which has arc-shaped curves in cutting plane. The cutting plane runs parallel to the optical axis and contains X-direction. The two refractive powers are so selected that on illuminating the integrator with axially parallel light of the illuminance in a illumination field (16) do not deviate from a given target distribution more than 1 percent, along the X-direction. A sine condition is exactly valid between the a focal plane of two micro lenses and the illumination field. An independent claim is also included for the method for manufacturing of optical integrators.
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