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Illumination optics for use in microlithography projection illumination system, has place and time-dissolved detection device arranged such that device detects light intensity distribution based on light intensity distribution in plane
Illumination optics for use in microlithography projection illumination system, has place and time-dissolved detection device arranged such that device detects light intensity distribution based on light intensity distribution in plane
The optics has a place and time-dissolved detection device (30) that is arranged toward an uncoupling device (17), which is positioned in optical path length between a light deflection array (12) and a reticle plane (6). The place and time-dissolved detection device is impinged over the uncoupling device with an uncoupled illumination light. The place and time-dissolved detection device is arranged in such a manner that the device detects a light intensity distribution corresponding to a light intensity distribution in a plane (19). Independent claims are also included for the following: (1) a measuring method for determination of influence of an individual component (2) a monitoring method for monitoring light intensity distribution in a system pupil level of illumination optics (3) a microlithographic method for micro-structured components (4) a micro-structured unit.
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