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Projection exposure apparatus for microlithography, has manipulator with linear drive, which is designed as direct drive such that lens is displaced up to specific micrometers with accuracy of ten millimeters in two degrees of freedom
Projection exposure apparatus for microlithography, has manipulator with linear drive, which is designed as direct drive such that lens is displaced up to specific micrometers with accuracy of ten millimeters in two degrees of freedom
The apparatus has an illumination device and a projection objective. A lens is provided with a manipulator having a linear drive (11). The linear drive has an inner ring (12) and an outer mount (13), which are movable relative to one another in a direction of movement. The linear drive is designed as direct drive in such a way that the lens can be displaced up to 1.000 micrometer with an accuracy of 10 millimeter in two degrees of freedom. An independent claim is also included for a method for positioning and adjusting a lens in a projection exposure apparatus for microlithography.
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