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FABRICATION METHOD AND STRUCTURE OF RETARDATION PLATE USING A COLUMNAR MICRO-STRUCTURED DIELECTRIC THIN FILMS
FABRICATION METHOD AND STRUCTURE OF RETARDATION PLATE USING A COLUMNAR MICRO-STRUCTURED DIELECTRIC THIN FILMS
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机译：柱状微结构介电薄膜的延迟板制备方法与结构
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摘要
A structure of a retardation plate using a columnar micro-structured dielectric thin film and a manufacturing method thereof are provided to secure thermal stability and firm mechanical property better than that of the retardation plate using polymer or liquid crystals and to keep uniform retardation over a wide area. A structure of a retardation plate(10) using a columnar micro-structured dielectric thin film is composed of: a substrate(11) made of glasses or polymer; an anisotropic thin film layer(13) deposited on the upper side of the substrate and provided with a dielectric columnar micro-structure; and an isotropic thin film layer(15) deposited on the upper side of the anisotropic thin film layer to increase transmittance in a specific wavelength region and to protect the anisotropic thin film layer.
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