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Method and Instrument for Measuring Complex Dielectric Constant of a Sample by Optical Spectral Measurement
Method and Instrument for Measuring Complex Dielectric Constant of a Sample by Optical Spectral Measurement
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机译：用光谱测量法测量样品复介电常数的方法和仪器
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摘要
A substrate in a parallelepiped plate form satisfies an interference condition when incident light has a wavelength (λ) fallen under the following (d: thickness, n: refractive index, θ: incident angle, N: integer). ; ]]> ;At this time, the light in a transmission spectrum is intensified to cause a fringe peak to appear, whereas the light in a reflection spectrum is weakened to provide a fringe valley. At around the wavelength (frequency), as the incident angle is increased, the transmittance nears zero while reflectance increases nearing 1. Increasing the thickness of the substrate by placing a thin film thereon is similar to the increase in the substrate thickness in [Equation 7], whereby the wavelength satisfying the interference condition shifts toward the longer wavelength (lower frequency) Due to the three effects, at a great incident angle, a ratio of an optical (transmission or reflection) spectrum of a system having a substrate and thin film to an optical spectrum of a substrate only becomes a spectrum having a structure wherein maximum and minimum values are adjacent to each other. By analyzing this relative transmission spectrum or relative reflection spectrum, a complex dielectric constant of the thin film can be determined.
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