首页> 外国专利> POLYMER-GRAFTED COLLOIDAL SILICA, POLYMER-GRAFTED COLLOIDAL SILICA DISPERSION AND ITS MANUFACTURING METHOD

POLYMER-GRAFTED COLLOIDAL SILICA, POLYMER-GRAFTED COLLOIDAL SILICA DISPERSION AND ITS MANUFACTURING METHOD

机译:聚合物接枝的胶体二氧化硅,聚合物接枝的胶体二氧化硅分散体及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a polymer-grafted colloidal silica in which colloid crystals are regularly arranged as fine particles in an organic solvent, and a polymer-grafted colloidal silica dispersed body.;SOLUTION: The polymer-grafted colloidal silica is prepared by binding a silyl residue, that is prepared by hydrolyzing a polymeric silane coupling agent represented by general formula (1), to a colloidal silica, wherein, in the general formula (1), R1 is a methyl group or a hydrogen atom, R2 is a methoxy group [CH3O-], a methyl amino group [CH3NH-], a dimethyl amino group [(CH3)2N-] or an isopropyl amino group [(CH3)2CHNH-], R3 is a methyl group or a hydrogen atom, m is a positive number of 18-300, and n is a positive number of 3-100.;COPYRIGHT: (C)2008,JPO&INPIT
机译:要解决的问题:提供一种聚合物接枝的胶体二氧化硅,其中胶体晶体在有机溶剂中规则地排列成细颗粒,并提供一种聚合物接枝的胶体二氧化硅分散体。通过水解通式(1)表示的聚合硅烷偶联剂制备的甲硅烷基残基与胶体二氧化硅结合,其中在通式(1)中,R 1 是甲基基或氢原子,R 2 是甲氧基[CH 3 O-],甲基氨基[CH 3 NH-] ,二甲基氨基[(CH 3 2 N-]或异丙基氨基[(CH 3 2 < / Sub> CHNH-],R 3 是甲基或氢原子,m为18-300的正数,n为3-100的正数。 C)2008,日本特许厅

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